利用直流磁控溅射大规模制备热电性能增强的三元铋酸铋薄膜

W. Fang, K. Liou, M. Leu
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引用次数: 6

摘要

大规模合成具有增强电学性能和塞贝克系数的铋酸铋薄膜。经退火处理后,原位生长的bbte薄膜具有较低的载流子浓度和较高的电子迁移率。从高分辨率透射电镜(HRTEM)图像中,证实了退火诱导的Sb优先扩散现象,并阐述了电性能可以改善的原因。此外,在热处理后的bbte薄膜中还嵌入了富sb相的析出。这证明了大规模制造具有高功率因数的bbte薄膜的可行性,这在实现高性能室温热电(TE)应用方面是非常有前途的。
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Large-scale preparation of ternary BiSbTe films with enhanced thermoelectric properties using DC magnetron sputtering
Large-scale synthesis of BiSbTe films with enhanced electrical property and Seebeck coefficient has been demonstrated in this work. As-grown BiSbTe films are found to have lower carrier concentration and higher electron mobility after the post annealing fulfilled. From the resultant high-resolution transmission electron microscope (HRTEM) images, the phenomenon of annealinginduced preferential Sb diffusion is corroborated to elaborate the reason why electrical properties could be improved. Moreover, the precipitation of Sb-rich phase is embedded in the thermally-treated BiSbTe films. Such the feasibility of large-scale fabrication of BiSbTe films with the elevated power factor is evidenced and this is very promising in the realization of room-temperature thermoelectric (TE) applications with high performances.
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