{"title":"气相外延过程中质量和热输运非线性模型的分析方法——提高薄膜性能的一种可能性","authors":"P. E.L, Bulaeva E.A","doi":"10.5121/IJOE.2017.6401","DOIUrl":null,"url":null,"abstract":"In this paper we introduce an analytical approach to calculate the distribution of velocity of flow of the gas mixture, the concentration distributions of the growth component and temperature fields in the zone of deposition of semiconductor layers in chemical vapor deposition using a reaction chamber with a rotating disk substrate holder. The results of analysis of the temperature and concentration fields in the reduced and atmospheric conditions (~ 0.1 atm.) pressure in the reaction chamber obtained based on the proposed theoretical models.","PeriodicalId":14375,"journal":{"name":"International Journal of Online Engineering","volume":"111 1","pages":"1-12"},"PeriodicalIF":0.0000,"publicationDate":"2017-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"On Approach to Analyze Non-Linear Model of Mass and Heat Transport During Gas Phase Epitaxy - A Possibility to Improve Properties of Films\",\"authors\":\"P. E.L, Bulaeva E.A\",\"doi\":\"10.5121/IJOE.2017.6401\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper we introduce an analytical approach to calculate the distribution of velocity of flow of the gas mixture, the concentration distributions of the growth component and temperature fields in the zone of deposition of semiconductor layers in chemical vapor deposition using a reaction chamber with a rotating disk substrate holder. The results of analysis of the temperature and concentration fields in the reduced and atmospheric conditions (~ 0.1 atm.) pressure in the reaction chamber obtained based on the proposed theoretical models.\",\"PeriodicalId\":14375,\"journal\":{\"name\":\"International Journal of Online Engineering\",\"volume\":\"111 1\",\"pages\":\"1-12\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-10-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of Online Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.5121/IJOE.2017.6401\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Online Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.5121/IJOE.2017.6401","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
On Approach to Analyze Non-Linear Model of Mass and Heat Transport During Gas Phase Epitaxy - A Possibility to Improve Properties of Films
In this paper we introduce an analytical approach to calculate the distribution of velocity of flow of the gas mixture, the concentration distributions of the growth component and temperature fields in the zone of deposition of semiconductor layers in chemical vapor deposition using a reaction chamber with a rotating disk substrate holder. The results of analysis of the temperature and concentration fields in the reduced and atmospheric conditions (~ 0.1 atm.) pressure in the reaction chamber obtained based on the proposed theoretical models.
期刊介绍：
We would like to inform you, that iJOE, the ''International Journal of Online Engineering'' will accept now also papers in the field of Biomedical Engineering and e-Health''. iJOE will therefore be published from January 2019 as the ''International Journal of Online and Biomedical Engineering''. The objective of the journal is to publish and discuss fundamentals, applications and experiences in the fields of Online Engineering (remote engineering, virtual instrumentation and online simulations, etc) and Biomedical Engineering/e-Health. The use of cyber-physical systems, virtual and remote controlled devices and remote laboratories are the directions for advanced teleworking/e-working environments. In general, online engineering is a future trend in engineering and science. Due to the growing complexity of engineering tasks, more and more specialized and expensive equipment as well as software tools and simulators, shortage of highly qualified staff, and the demands of globalization and collaboration activities, it become essential to utilize cyber cloud technologies to maximize the use of engineering resources. Online engineering is the way to address these issues. Considering these, one focus of the International Journal of Online and Biomedical Engineering is to provide a platform to publish fundamentals, applications and experiences in the field of Online Engineering, for example: Remote Engineering Internet of Things Cyber-physical Systems Digital Twins Industry 4.0 Virtual Instrumentation. An important application field of online engineering tools and principles are Biomedical Engineering / e-Health. Topics we are interested to publish are: Automation Technology for Medical Applications Big Data in Medicine Biomedical Devices Biosensors Biosignal Processing Clinical Informatics Computational Neuroscience Computer-Aided Surgery.
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