C. Glidewell, D. Rankin, A. Robiette, G. Sheldrick, S. M. Williamson
{"title":"二(三氟甲基)硝基的分子结构:电子衍射研究","authors":"C. Glidewell, D. Rankin, A. Robiette, G. Sheldrick, S. M. Williamson","doi":"10.1039/J19710000478","DOIUrl":null,"url":null,"abstract":"The molecular structure of bis-(trifluoromethyl)nitroxyl, (CF3)2NO, has been determined in the vapour phase by the sector microphotometer electron diffraction method. Principal structural parameters with estimated standard deviations in parentheses are: r(NO) 1·26(3), r(CN) 1·441(8), and r(CF) 1·320(4)A; F–C–F 109·8°(1·0°), C–N–C 120·9°(2·0°), C–N–O 117·2°(0·6°). The angle between the CNC plane and the NO bond is 22°(3°).","PeriodicalId":17321,"journal":{"name":"Journal of The Chemical Society A: Inorganic, Physical, Theoretical","volume":"110 1","pages":"478-481"},"PeriodicalIF":0.0000,"publicationDate":"1971-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Molecular structure of bis(trifluoromethyl)nitroxyl: an electron diffraction study\",\"authors\":\"C. Glidewell, D. Rankin, A. Robiette, G. Sheldrick, S. M. Williamson\",\"doi\":\"10.1039/J19710000478\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The molecular structure of bis-(trifluoromethyl)nitroxyl, (CF3)2NO, has been determined in the vapour phase by the sector microphotometer electron diffraction method. Principal structural parameters with estimated standard deviations in parentheses are: r(NO) 1·26(3), r(CN) 1·441(8), and r(CF) 1·320(4)A; F–C–F 109·8°(1·0°), C–N–C 120·9°(2·0°), C–N–O 117·2°(0·6°). The angle between the CNC plane and the NO bond is 22°(3°).\",\"PeriodicalId\":17321,\"journal\":{\"name\":\"Journal of The Chemical Society A: Inorganic, Physical, Theoretical\",\"volume\":\"110 1\",\"pages\":\"478-481\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1971-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of The Chemical Society A: Inorganic, Physical, Theoretical\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1039/J19710000478\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of The Chemical Society A: Inorganic, Physical, Theoretical","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1039/J19710000478","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Molecular structure of bis(trifluoromethyl)nitroxyl: an electron diffraction study
The molecular structure of bis-(trifluoromethyl)nitroxyl, (CF3)2NO, has been determined in the vapour phase by the sector microphotometer electron diffraction method. Principal structural parameters with estimated standard deviations in parentheses are: r(NO) 1·26(3), r(CN) 1·441(8), and r(CF) 1·320(4)A; F–C–F 109·8°(1·0°), C–N–C 120·9°(2·0°), C–N–O 117·2°(0·6°). The angle between the CNC plane and the NO bond is 22°(3°).