二(三氟甲基)硝基的分子结构:电子衍射研究

C. Glidewell, D. Rankin, A. Robiette, G. Sheldrick, S. M. Williamson
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引用次数: 9

摘要

用扇形显微电子衍射法测定了双(三氟甲基)硝基(CF3)2NO在气相中的分子结构。括号中估计标准差的主要结构参数为:r(NO) 1.26 (3), r(CN) 1.441 (8), r(CF) 1.320 (4)A;F-C-F 109·8°(1·0°),C-N-C 120·9°(2·0°),C-N-O 117·2°(0·6°)。CNC平面与NO键之间的角度为22°(3°)。
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Molecular structure of bis(trifluoromethyl)nitroxyl: an electron diffraction study
The molecular structure of bis-(trifluoromethyl)nitroxyl, (CF3)2NO, has been determined in the vapour phase by the sector microphotometer electron diffraction method. Principal structural parameters with estimated standard deviations in parentheses are: r(NO) 1·26(3), r(CN) 1·441(8), and r(CF) 1·320(4)A; F–C–F 109·8°(1·0°), C–N–C 120·9°(2·0°), C–N–O 117·2°(0·6°). The angle between the CNC plane and the NO bond is 22°(3°).
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