GaN HEMT中AlGaN层电荷捕获位分布的提取方法

T. Baba, K. Kakushima, H. Wakabayashi, K. Tsutsui, H. Iwai
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引用次数: 0

摘要

对GaN HEMT中AlGaN层的电子陷阱密度和分布进行了表征。基于2DEG和陷阱位点之间的电子隧穿,可以通过频率相关的电容和电导响应提取距离和密度。通过对实测电容和电导谱的参数拟合,得到了Nbt = 1021 cm-3eV-1的陷阱密度。在不同的栅极电压或测量温度下,可以在相同的频率范围内提取AlGaN层内的陷阱分布。从测量温度依赖性出发,得到了活化能为0.42 eV的俘获截面σ0 = 8 × 10-10 cm2。
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An extraction method of charge trapping site distribution in AlGaN layer in GaN HEMT
The density and distribution of electron traps in AlGaN layer of GaN HEMT have been characterized. Based on electron tunneling between 2DEG and trap sites, the distance and density can be extracted with frequency dependent capacitance and conductance responses. With parameter fitting to measured capacitance and conductance spectra, a trap density of Nbt = 1021 cm-3eV-1 has be extracted. With different gate voltage or measurement temperature, the trap distribution within the AlGaN layer can be extracted under the same frequency range. From measurement temperature dependency, a capture cross section σ0 = 8 × 10-10 cm2 with an activation energy of 0.42 eV has been extracted.
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