{"title":"直写光刻的杂化结构——纳米压印对灰度光刻胶对比度和表面形貌的调节","authors":"Sijia Xie, J. Erjawetz, C. Schuster, H. Schift","doi":"10.1116/6.0001206","DOIUrl":null,"url":null,"abstract":"Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":null,"pages":null},"PeriodicalIF":1.4000,"publicationDate":"2021-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint\",\"authors\":\"Sijia Xie, J. Erjawetz, C. Schuster, H. Schift\",\"doi\":\"10.1116/6.0001206\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.\",\"PeriodicalId\":17495,\"journal\":{\"name\":\"Journal of Vacuum Science & Technology B\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2021-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Vacuum Science & Technology B\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0001206\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology B","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0001206","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint
Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.
期刊介绍:
Journal of Vacuum Science & Technology B emphasizes processing, measurement and phenomena associated with micrometer and nanometer structures and devices. Processing may include vacuum processing, plasma processing and microlithography among others, while measurement refers to a wide range of materials and device characterization methods for understanding the physics and chemistry of submicron and nanometer structures and devices.