F. Fujie, Hongyu Peng, Tuerxun Ailihumaer, B. Raghothamachar, M. Dudley, S. Harada, M. Tagawa, T. Ujihara
{"title":"4H-SiC晶体表面下不同深度bpd的同步加速器x射线形貌图像对比度变化","authors":"F. Fujie, Hongyu Peng, Tuerxun Ailihumaer, B. Raghothamachar, M. Dudley, S. Harada, M. Tagawa, T. Ujihara","doi":"10.2139/ssrn.3762210","DOIUrl":null,"url":null,"abstract":"The contrast features of synchrotron X-ray topographic images of screw-type basal plane dislocations (BPDs) in on-axis 4H-SiC wafers have been studied. Screw BPD images are categorized into two types: one exhibiting a white line bordered by black lines and the other a pure black line contrast. Similar images for off-axis specimens and the corresponding ray-tracing simulations demonstrate that these contrasts can be attributed to the depth of the screw BPDs below the crystal surface. The correlation of the contrast features between simulations and the screw BPD topography images can be used to estimate the depth.","PeriodicalId":7755,"journal":{"name":"AMI: Acta Materialia","volume":"61 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2021-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Synchrotron X-Ray Topographic Image Contrast Variation of BPDs Located at Different Depths Below the Crystal Surface in 4H-SiC\",\"authors\":\"F. Fujie, Hongyu Peng, Tuerxun Ailihumaer, B. Raghothamachar, M. Dudley, S. Harada, M. Tagawa, T. Ujihara\",\"doi\":\"10.2139/ssrn.3762210\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The contrast features of synchrotron X-ray topographic images of screw-type basal plane dislocations (BPDs) in on-axis 4H-SiC wafers have been studied. Screw BPD images are categorized into two types: one exhibiting a white line bordered by black lines and the other a pure black line contrast. Similar images for off-axis specimens and the corresponding ray-tracing simulations demonstrate that these contrasts can be attributed to the depth of the screw BPDs below the crystal surface. The correlation of the contrast features between simulations and the screw BPD topography images can be used to estimate the depth.\",\"PeriodicalId\":7755,\"journal\":{\"name\":\"AMI: Acta Materialia\",\"volume\":\"61 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-01-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"AMI: Acta Materialia\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2139/ssrn.3762210\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"AMI: Acta Materialia","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2139/ssrn.3762210","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Synchrotron X-Ray Topographic Image Contrast Variation of BPDs Located at Different Depths Below the Crystal Surface in 4H-SiC
The contrast features of synchrotron X-ray topographic images of screw-type basal plane dislocations (BPDs) in on-axis 4H-SiC wafers have been studied. Screw BPD images are categorized into two types: one exhibiting a white line bordered by black lines and the other a pure black line contrast. Similar images for off-axis specimens and the corresponding ray-tracing simulations demonstrate that these contrasts can be attributed to the depth of the screw BPDs below the crystal surface. The correlation of the contrast features between simulations and the screw BPD topography images can be used to estimate the depth.