{"title":"解释大面积场发射体的场发射方程","authors":"D. Biswas","doi":"10.1116/6.0001683","DOIUrl":null,"url":null,"abstract":"Both single emitters and large area field emitters (LAFE) are generally characterized using the slope and intercept of a Murphy-Good (or Fowler-Nordheim) plot which are used to extract the field enhancement factor and the emission area. Using a shielding model that has been developed recently for a LAFE, the validity of the underlying assumption is investigated. It is found that in case of a LAFE, the slope has contributions from the enhancement factor as well as the rate at which the effective number of super-emitters changes with the applied field. As a consequence, the emission area is related to both the slope and the intercept in a LAFE. When the mean spacing in a LAFE is much larger than the height of emitter, the usual interpretation of the slope and intercept are recovered.","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"24 1","pages":""},"PeriodicalIF":1.4000,"publicationDate":"2021-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Interpreting the field emission equation for large area field emitters\",\"authors\":\"D. Biswas\",\"doi\":\"10.1116/6.0001683\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Both single emitters and large area field emitters (LAFE) are generally characterized using the slope and intercept of a Murphy-Good (or Fowler-Nordheim) plot which are used to extract the field enhancement factor and the emission area. Using a shielding model that has been developed recently for a LAFE, the validity of the underlying assumption is investigated. It is found that in case of a LAFE, the slope has contributions from the enhancement factor as well as the rate at which the effective number of super-emitters changes with the applied field. As a consequence, the emission area is related to both the slope and the intercept in a LAFE. When the mean spacing in a LAFE is much larger than the height of emitter, the usual interpretation of the slope and intercept are recovered.\",\"PeriodicalId\":17495,\"journal\":{\"name\":\"Journal of Vacuum Science & Technology B\",\"volume\":\"24 1\",\"pages\":\"\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2021-12-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Vacuum Science & Technology B\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0001683\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology B","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0001683","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Interpreting the field emission equation for large area field emitters
Both single emitters and large area field emitters (LAFE) are generally characterized using the slope and intercept of a Murphy-Good (or Fowler-Nordheim) plot which are used to extract the field enhancement factor and the emission area. Using a shielding model that has been developed recently for a LAFE, the validity of the underlying assumption is investigated. It is found that in case of a LAFE, the slope has contributions from the enhancement factor as well as the rate at which the effective number of super-emitters changes with the applied field. As a consequence, the emission area is related to both the slope and the intercept in a LAFE. When the mean spacing in a LAFE is much larger than the height of emitter, the usual interpretation of the slope and intercept are recovered.
期刊介绍:
Journal of Vacuum Science & Technology B emphasizes processing, measurement and phenomena associated with micrometer and nanometer structures and devices. Processing may include vacuum processing, plasma processing and microlithography among others, while measurement refers to a wide range of materials and device characterization methods for understanding the physics and chemistry of submicron and nanometer structures and devices.