基于等离子体的多功能材料工程概念及其应用于大面积等离子体衬底的合成和控制介电体中的电荷注入

K. Makasheva, B. Despax, C. Laurent, L. Millière, C. Villeneuve-Faure, C. Bonafos, A. Pugliara, R. Carles, L. Boudou, G. Teyssèdre
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引用次数: 0

摘要

在这贡献中提出的方法涉及多功能材料工程的等离子沉积过程。它为从物质层面的开发过渡到系统层面的应用开辟了道路。这一概念被应用于纳米复合材料薄层的沉积,包括单层银纳米颗粒(AgNPs)嵌入到二氧化硅类基质中,距离自由表面有一定距离,并应用于两个不同的领域,即等离子体学,以获得大面积等离子体嵌入衬底和电气工程,以控制电介质中的电荷注入。样品的结构、光学和电学表征证实了该工艺的效率。
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Plasma based concept for engineering of multifunctional materials with application to synthesis of large-area plasmonic substrates and to control the charge injection in dielectrics
The proposed approach in this contribution concerns plasma deposition processes for engineering of multifunctional materials. It opens the way for transition from material level of development to system level of applications. This concept is applied for deposition of nanocomposite thin layers comprising a single layer of silver nanoparticles (AgNPs) embedded in silica-like host matrices at a controlled distance from the free surface with application in two distinguished fields, namely plasmonics to obtain large-area plasmonic embedded substrates and electrical engineering to control the charge injection in dielectrics. Structural, optical and electrical characterizations of the samples confirm the process efficiency.
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