rf磁控溅射法制备镧修饰PbTiO/ sub3 /薄膜及其性能

K. Iijima, T. Takeuchi, N. Nagao, R. Takayama, I. Ueda
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引用次数: 3

摘要

采用射频磁控溅射技术,在(100)MgO和(100)Pt/MgO衬底上制备了高度c轴取向的Pb/sub - 1-x/La/sub -x/ Ti/sub - 1-x/4/O/sub - 3/ (PLT)薄膜。用x射线、电子衍射和电子显微镜对这些薄膜进行了表征。讨论了薄膜的生长方式和c轴取向机理,电介质测量揭示了PLT薄膜的相变行为。当x=0.15时,PLT薄膜的热释电系数为9.5/spl倍/10/sup -8/ C/cm/sup 2/ K,介电常数为330。
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Preparation and properties of lanthanum modified PbTiO/sub 3/ thin films by rf-magnetron sputtering
Highly c-axis oriented Pb/sub 1-x/La/sub x/Ti/sub 1-x/4/O/sub 3/ (PLT) thin films were prepared by rf-magnetron sputtering on (100)MgO and (100)Pt/MgO substrate. These films were characterized by X-ray and electron diffraction and electron microscope. Thin film growth manner and c-axis orientation mechanism were discussed, Dielectric measurement revealed the phase transition behavior of PLT thin films. PLT thin film of x=0.15 shows an extremely large pyroelectric coefficient of 9.5/spl times/10/sup -8/ C/cm/sup 2/ K and low dielectric constant of 330.
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