不同结构GaN SBD的性能仿真

Cheng Haijuan, G. Weiling, Ma Qijing, Guo Hao, Qin Yalong
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引用次数: 0

摘要

为了研究不同结构GaN肖特基势垒二极管(SBD)的性能,模拟了原始、混合阳极和栅极控制边缘终端(GET)的GaN肖特基势垒二极管(SBD)的正向和反向特性,并比较了每种器件的结构参数对其电学特性的影响。仿真结果表明,混合阳极GaN SBD的导通电压最低(0.74V),正向电流最大,击穿电压在中间。GET GaN SBD的导通电压处于中间位置,正向电流低于原结构,但击穿电压最高,达到1586V。综合考虑,GET GaN SBD的性能最好。
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Performance Simulation of GaN SBD With Different Structures
In order to study the performance of GaN schottky barrier diodes (SBD) with different structures, the forward and reverse characteristics of GaN SBD with original, hybrid anode and gate controlled edge terminal (GET) are simulated, and the effects of the structural parameters of each device on the electrical characteristics are compared. The simulation results show that the turn-on voltage of hybrid anode GaN SBD is the lowest (0.74V),The forward current is the largest, the breakdown voltage is in the middle. The turn-on voltage of GET GaN SBD is in the middle, and the forward current is lower than that of original structure, but the breakdown voltage is the highest, reaching 1586V. Comprehensively considered, the performance of GET GaN SBD is the best.
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