Dong-Ho Lee, Hwan-Seok Jeong, Yeongkyun Kim, Myeong-Ho Kim, K. Son, J. Lim, Sang-Hun Song, H. Kwon
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Quantitative Analysis of Channel Width Effects on Electrical Performance Degradation of Top-gate Self-aligned Coplanar IGZO Thin-film Transistors under Self-heating Stresses
期刊介绍：
Journal of Semiconductor Technology and Science is published to provide a forum for R&D people involved in every aspect of the integrated circuit technology, i.e., VLSI fabrication process technology, VLSI device technology, VLSI circuit design and other novel applications of this mass production technology. When IC was invented, these people worked together in one place. However, as the field of IC expanded, our individual knowledge became narrower, creating different branches in the technical society, which has made it more difficult to communicate as a whole. The fisherman, however, always knows that he can capture more fish at the border where warm and cold-water meet. Thus, we decided to go backwards gathering people involved in all VLSI technology in one place.
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