镀铜聚合物基板上PZT压电薄膜的成分分析

A. Kleiner, G. Suchaneck, B. Adolphi, G. Gerlach, V. Lavrentiev, Z. Hubička, M. Čada, L. Jastrabík, A. Dejneka
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引用次数: 0

摘要

本文研究了以直径200 mm的金属靶(Pb, Ti, Zr)为基体,采用反应磁控溅射法制备Pb(Zr, Ti)O3 (PZT)纳米晶薄膜的组成。采用高功率脉冲溅射技术交替制备Zr或ti靶。采用x射线光电子能谱(XPS)和卢瑟福后向散射(RBS)对样品进行了成分分析。重新校准RBS数据以排除非XPS测定的氢含量。讨论了两种方法在PZT成分分析中的优缺点。
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Composition profiling of piezoelectric PZT thin films deposited onto Cu coated polymer substrates
In this work, we investigate the composition profile of nanocrystalline Pb(Zr, Ti)O3 (PZT) thin films deposited by means of reactive magnetron sputtering from 200 mm diameter metallic targets (Pb, Ti, Zr). High-power pulse sputtering has been employed for alternatively the Zr- or Ti-target. Composition analysis and profiling was performed by means of X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering (RBS). RBS data was recalibrated to exclude hydrogen content not determined by XPS. Advantages and drawbacks of both methods for PZT composition profiling are discussed.
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