A. Kleiner, G. Suchaneck, B. Adolphi, G. Gerlach, V. Lavrentiev, Z. Hubička, M. Čada, L. Jastrabík, A. Dejneka
{"title":"镀铜聚合物基板上PZT压电薄膜的成分分析","authors":"A. Kleiner, G. Suchaneck, B. Adolphi, G. Gerlach, V. Lavrentiev, Z. Hubička, M. Čada, L. Jastrabík, A. Dejneka","doi":"10.1109/ISAF.2012.6297777","DOIUrl":null,"url":null,"abstract":"In this work, we investigate the composition profile of nanocrystalline Pb(Zr, Ti)O3 (PZT) thin films deposited by means of reactive magnetron sputtering from 200 mm diameter metallic targets (Pb, Ti, Zr). High-power pulse sputtering has been employed for alternatively the Zr- or Ti-target. Composition analysis and profiling was performed by means of X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering (RBS). RBS data was recalibrated to exclude hydrogen content not determined by XPS. Advantages and drawbacks of both methods for PZT composition profiling are discussed.","PeriodicalId":20497,"journal":{"name":"Proceedings of ISAF-ECAPD-PFM 2012","volume":"56 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Composition profiling of piezoelectric PZT thin films deposited onto Cu coated polymer substrates\",\"authors\":\"A. Kleiner, G. Suchaneck, B. Adolphi, G. Gerlach, V. Lavrentiev, Z. Hubička, M. Čada, L. Jastrabík, A. Dejneka\",\"doi\":\"10.1109/ISAF.2012.6297777\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we investigate the composition profile of nanocrystalline Pb(Zr, Ti)O3 (PZT) thin films deposited by means of reactive magnetron sputtering from 200 mm diameter metallic targets (Pb, Ti, Zr). High-power pulse sputtering has been employed for alternatively the Zr- or Ti-target. Composition analysis and profiling was performed by means of X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering (RBS). RBS data was recalibrated to exclude hydrogen content not determined by XPS. Advantages and drawbacks of both methods for PZT composition profiling are discussed.\",\"PeriodicalId\":20497,\"journal\":{\"name\":\"Proceedings of ISAF-ECAPD-PFM 2012\",\"volume\":\"56 1\",\"pages\":\"1-3\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-07-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of ISAF-ECAPD-PFM 2012\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISAF.2012.6297777\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of ISAF-ECAPD-PFM 2012","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISAF.2012.6297777","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Composition profiling of piezoelectric PZT thin films deposited onto Cu coated polymer substrates
In this work, we investigate the composition profile of nanocrystalline Pb(Zr, Ti)O3 (PZT) thin films deposited by means of reactive magnetron sputtering from 200 mm diameter metallic targets (Pb, Ti, Zr). High-power pulse sputtering has been employed for alternatively the Zr- or Ti-target. Composition analysis and profiling was performed by means of X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering (RBS). RBS data was recalibrated to exclude hydrogen content not determined by XPS. Advantages and drawbacks of both methods for PZT composition profiling are discussed.