低功函数薄膜上视势垒高度的偏置电压依赖性测量

K. Nagaoka, S. Ohmi
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引用次数: 2

摘要

利用扫描隧道显微镜,研究了偏置电压对势垒表观高度的影响。本研究使用的样品是氮掺杂的六硼化镧薄膜。实验证明了势垒表观高度与样品偏置电压之间存在线性关系。因此,我们通过理论拟合估计薄膜的功函数为2.35 eV。这一数值与前人研究的光谱学结果吻合较好。我们的结果表明,尽管采用简单的一维模型,但通过视障高度测量计算的功函数具有很高的可靠性。我们预计障壁高度对样品功函数的敏感性可以用于具有特征功函数的表面上的元素识别。
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Bias-voltage-dependent measurement of apparent barrier height on low-work-function thin film
Using a scanning tunneling microscope, we have examined the effect of the bias voltage on the apparent barrier height. The sample used in this study was a nitrogen-doped lanthanum hexaboride film. We experimentally proved that a linear relationship exists between the apparent barrier height and the sample bias voltage. As a consequence, we estimated the work function of the film to be 2.35 eV by theoretical fitting. This value is in good agreement with that obtained by photoemission spectroscopy in a previous study. Our results demonstrate that the work function calculated through apparent barrier height measurements is guaranteed to be highly reliable in spite of the simple one-dimensional model. We anticipate that the sensitivity of the barrier height to the sample work function can be utilized for elemental identification on surfaces with characteristic work functions.
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