β-Ga2O3/Si基肖特基势垒二极管中与衬底取向相关的电流输运机制

M. Yadav, A. Mondal, S. Sharma, A. Bag
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引用次数: 7

摘要

蓝宝石和氧化镓在β-Ga2O3器件上被用作衬底。然而,硅(Si)在地球上是一种丰富的材料,导致这种衬底更容易和低成本的可用性,以及更高的导热性,这使得硅成为一个有前途和潜在的衬底候选人,可以快速商业化。因此,为了加强Ga2O3在Si上集成技术的可行性,我们利用脉冲激光沉积技术在(100)和(111)取向的p-Si衬底上沉积了β-Ga2O3。用x射线衍射观察了两种样品的β- ga2o3膜的单相(β)和多晶性质。用原子力显微镜测得Ga2O3/Si(100)的均方根粗糙度为3.62 nm,而Ga2O3/Si(111)的均方根粗糙度为5.43 nm。此外,Ga2O3/Si(100)表现出更光滑均匀的Ga2O3膜表面,而Ga2O3/Si(111)似乎具有粗糙的表面和坑状缺陷。这可能是由于Si(111)的六边形投影不适合获得良好的倾斜长方体或单斜Ga2O3晶体,不像Si(100)的矩形投影。利用电流-电压(I-V)和电容-电压(C-V)特性提取了所制备肖特基势垒二极管的电学参数。与Si(111)上的Ga2O3不同,Si(100)上的Ga2O3多晶薄膜由于Ga2O3和Si(100)晶体具有矩形突起的紧密对称性,导致Ga2O3/Si异质界面上出现的缺陷较少。这些更少的缺陷最终导致Ga2O3/Si(100)的二极管性能更好,我们已经观察到典型的热离子主导载流子传输,而缺陷辅助热离子场发射是Ga2O3/Si(111)的主要载流子传输机制。因此,Si(100)衬底被证明是一个比Si(111)更好和潜在的Ga2O3器件平台。
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Substrate orientation dependent current transport mechanisms in β-Ga2O3/Si based Schottky barrier diodes
Sapphire and gallium oxide have been used as substrates for most of the reported results on β-Ga2O3 devices. However, silicon (Si) is an abundant material on the Earth, leading to easier and low-cost availability of this substrate, along with higher thermal conductivity, which makes Si a promising and potential substrate candidate for rapid commercialization. Therefore, in order to strengthen the feasibility of Ga2O3 on Si integration technology, we have deposited β-Ga2O3 on (100) and (111) oriented p-Si substrates using a pulsed laser deposition technique. A single-phase (β) and polycrystalline nature of the β-Ga2O3 film is observed for both samples using x-ray diffraction. A low root mean square roughness of 3.62 nm has been measured for Ga2O3/Si(100), as compared to 5.43 nm of Ga2O3/Si(111) using atomic force microscope. Moreover, Ga2O3/Si(100) shows a smoother and uniform surface of the Ga2O3 film, whereas Ga2O3/Si(111) seems to have a rougher surface with pitlike defects. This might be due to the hexagonal projection of Si (111) that is not suitable for obtaining a good tilted cuboid or monoclinic Ga2O3 crystal unlike the rectangle projection of Si (100). The electrical parameters of the fabricated Schottky barrier diodes were extracted using current–voltage (I–V) and capacitance–voltage (C–V) characteristics. The polycrystalline Ga2O3 film on Si(100) leads to fewer defects emerging from the Ga2O3/Si heterointerface due to the close symmetry of Ga2O3 and the Si(100) crystal with rectangle projections unlike Ga2O3 on Si(111). These fewer defects eventually lead to a better diode performance of Ga2O3/Si(100) where we have observed typical thermionic dominating carrier transport, whereas defect-assisted thermionic field emission has been the primary carrier transport mechanism in Ga2O3/Si(111). Hence, the Si (100) substrate is demonstrated to be a better and potential platform for Ga2O3 devices than Si (111).
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