增透涂层对纳米晶量子点降移薄膜硅太阳电池性能的影响

Ala H. Sabeeh, Alyssa N. Brigman, J. Ruzyllo
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引用次数: 0

摘要

本实验探讨了氟化锂(LiF)增透涂层(ARC)对雾沉积纳米晶量子点(NQD)降挡膜商用硅太阳能电池性能的影响。研究了覆盖层沉积和图像化NQD和ARC薄膜的影响。观察到有ARC的电池性能显著改善。具体而言,在300-400 nm的紫外范围内,覆盖AR涂层的硅太阳能电池的平均外量子效率提高了67%。NQD/LiF薄膜的微图像化改善了电池内部的光捕获,提高了电池的功率转换效率(PCE) 19.5%。总之,本实验表明,在薄雾沉积的NQD降挡膜顶部形成ARC,可显著提高商用硅太阳能电池的性能。
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Effect of anti-reflection coating on the performance of silicon solar cells with nanocrystalline quantum dots downshifting film
This experiment explores the effect of lithium fluoride (LiF) antireflection coating (ARC) on the performance of commercial silicon solar cells with mist deposited nanocrystalline quantum dots (NQD) downshifting film. The effect of blanket deposited and patterned NQD and ARC films is investigated. Significant improvement of the performance of cells with ARC is observed. Specifically, 67% increase in the average external quantum efficiency of silicon solar cells covered with AR coating in the UV range of 300–400 nm is noted. The micropatterning of NQD/LiF films improves light trapping inside the cell and enhances power conversion efficiency (PCE) of the cell by 19.5%. Overall, this experiment demonstrates that the ARC formation on top of the mist deposited NQD downshifting film results in measurable improvement in the performance of the commercial silicon solar cells.
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