AFM光刻技术在功能化表面上制备金纳米粒子组件

Y. Jung, S. Ahn, H. Chae, Haeseong Lee, E. Kim, Haiwon Lee
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引用次数: 3

摘要

摘要:研究了金颗粒在图案衬底上的选择性沉积,以制备单电子晶体管。本研究利用原子力显微镜(AFM)实现了一种选择性定位技术。在硅表面制备了六甲基二硅烷(HMDS)和十八烷基二甲基甲氧基硅烷(ODMS)自组装单层(sam)作为AFM光刻系统。防空导弹上刻着统一的图案。有效地完成了金的选择性沉积。用原子力显微镜对其进行了表征。
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The Fabrication of Gold Nanoparticle Assemblies on the Functionalized Surface Patterned by AFM Lithography
Abstract Selective deposition of gold particles on a patterned substrate was studied for fabrication of a single electrons transistor. In the present study, a selective positioning technique was achieved using atomic force microscope (AFM). Various self-assembled monolayers (SAMs) on silicon surface such as hexamethyldisilazane (HMDS) and octadecyl dimethylmethoxy silane (ODMS) SAMs were prepared as a system for AFM lithography. A uniform pattern was engraved on the SAMs. The selective deposition of gold was efficiently accomplished. This gold particle assembly was characterized by AFM.
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