基于ZnO纳米片的ZnO/Si异质结的多峰发射和电学性能

IF 3.9 Q2 NANOSCIENCE & NANOTECHNOLOGY Journal of Nanotechnology Pub Date : 2021-09-28 DOI:10.1155/2021/9267962
Yalan Ma, P. Ji, Yong Li, Yueli Song
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引用次数: 0

摘要

采用自旋镀膜技术在p型单晶硅上纺制ZnO纳米片,制备了ZnO/Si异质结。在336 nm激发下,记录了生长和退火ZnO/Si异质结的光致发光光谱。分析了退火ZnO/Si异质结在~ 360 nm和~ 430 nm之间的多峰,其起源归因于一个或多个LO声子的影响。从基于ZnO/Si异质结的原型器件中可以观察到整流效果。虽然通过分析电流密度-电压特性得到的参数与理想器件的参数相差较大,但相信通过调制和优化制造条件,本研究中的ZnO/Si异质结将成为光电领域的潜在候选器件。
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Multipeak Emissions and Electrical Properties of ZnO/Si Heterojunctions Based on ZnO Nanoflakes by Spin Coating Technique
ZnO/Si heterojunctions have been fabricated by spinning ZnO nanoflakes on the p-type single crystal silicon by using the spin coating technique. Photoluminescence spectra of as-grown and annealed ZnO/Si heterojunctions have been recorded under the excitation of 336 nm. Multipeaks between ∼360 nm and ∼430 nm from annealed ZnO/Si heterojunctions have been analyzed, the origins of which have been ascribed to the effects of one or multiple LO phonons. The rectifying effects can be observed from the prototypical devices based on ZnO/Si heterojunctions. Although the parameters obtained by analyzing the current density-voltage characteristics are away from those from the ideal device, it is believed that ZnO/Si heterojunctions in the present work will be a potential candidate in the optoelectronic field through modulating and optimizing the fabrication conditions.
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来源期刊
Journal of Nanotechnology
Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-
CiteScore
5.50
自引率
2.40%
发文量
25
审稿时长
13 weeks
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