{"title":"热蒸发与离子束溅射制备LaF 3 薄膜的光学特性","authors":"才玺坤, 张立超, 梅林, 时光","doi":"10.3788/CO.20140705.0808","DOIUrl":null,"url":null,"abstract":"To meet the requirements for different practical applications,we investigate the properties of single LaF3 layer deposited by resistive heating Mo-boat( RH) and ion beam sputtering( IBS) in this paper. First,transmittance and reflectance spectra of LaF3 thin films were measured by an UV-visible spectrophotometer,and the refractive indexes and extinction coefficients were obtained by using different models. Second,stresstemperature curves of LaF3 thin films during heating and cooling cycles were carried out by a stress measurement system. Finally,the X-ray diffraction( XRD) was used to characterize the microstructure of LaF3 layers.Experimental results indicate that LaF3 thin film fabricated by thermal evaporation( RH LaF3) had an inhomo-geneous refractive index; the refractive index and extinction coefficient at 193 nm are 1. 687 and 5 × 10- 4for RH LaF3,and 1. 714 and 9 ×10- 4for IBS LaF3,respectively. RH LaF3 and IBS LaF3 exhibited inverse stress status. RH LaF3 had a tensile stress and IBS LaF3 showed a compressive stress,which decreased after annealing. The transmittances are 99. 4% and 99. 2% for RH deposited MgF2/LaF3 AR coating and IBS deposited AlF3/LaF3 AR coating,and the corresponding measured reflectances are 0. 04% and 0. 1%,respectively.","PeriodicalId":10133,"journal":{"name":"Chinese Journal of Optics and Applied Optics","volume":"2 1","pages":"808-815"},"PeriodicalIF":0.0000,"publicationDate":"2014-06-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"热蒸发与离子束溅射制备LaF 3 薄膜的光学特性\",\"authors\":\"才玺坤, 张立超, 梅林, 时光\",\"doi\":\"10.3788/CO.20140705.0808\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"To meet the requirements for different practical applications,we investigate the properties of single LaF3 layer deposited by resistive heating Mo-boat( RH) and ion beam sputtering( IBS) in this paper. First,transmittance and reflectance spectra of LaF3 thin films were measured by an UV-visible spectrophotometer,and the refractive indexes and extinction coefficients were obtained by using different models. Second,stresstemperature curves of LaF3 thin films during heating and cooling cycles were carried out by a stress measurement system. Finally,the X-ray diffraction( XRD) was used to characterize the microstructure of LaF3 layers.Experimental results indicate that LaF3 thin film fabricated by thermal evaporation( RH LaF3) had an inhomo-geneous refractive index; the refractive index and extinction coefficient at 193 nm are 1. 687 and 5 × 10- 4for RH LaF3,and 1. 714 and 9 ×10- 4for IBS LaF3,respectively. RH LaF3 and IBS LaF3 exhibited inverse stress status. RH LaF3 had a tensile stress and IBS LaF3 showed a compressive stress,which decreased after annealing. The transmittances are 99. 4% and 99. 2% for RH deposited MgF2/LaF3 AR coating and IBS deposited AlF3/LaF3 AR coating,and the corresponding measured reflectances are 0. 04% and 0. 1%,respectively.\",\"PeriodicalId\":10133,\"journal\":{\"name\":\"Chinese Journal of Optics and Applied Optics\",\"volume\":\"2 1\",\"pages\":\"808-815\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-06-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chinese Journal of Optics and Applied Optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3788/CO.20140705.0808\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chinese Journal of Optics and Applied Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3788/CO.20140705.0808","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
To meet the requirements for different practical applications,we investigate the properties of single LaF3 layer deposited by resistive heating Mo-boat( RH) and ion beam sputtering( IBS) in this paper. First,transmittance and reflectance spectra of LaF3 thin films were measured by an UV-visible spectrophotometer,and the refractive indexes and extinction coefficients were obtained by using different models. Second,stresstemperature curves of LaF3 thin films during heating and cooling cycles were carried out by a stress measurement system. Finally,the X-ray diffraction( XRD) was used to characterize the microstructure of LaF3 layers.Experimental results indicate that LaF3 thin film fabricated by thermal evaporation( RH LaF3) had an inhomo-geneous refractive index; the refractive index and extinction coefficient at 193 nm are 1. 687 and 5 × 10- 4for RH LaF3,and 1. 714 and 9 ×10- 4for IBS LaF3,respectively. RH LaF3 and IBS LaF3 exhibited inverse stress status. RH LaF3 had a tensile stress and IBS LaF3 showed a compressive stress,which decreased after annealing. The transmittances are 99. 4% and 99. 2% for RH deposited MgF2/LaF3 AR coating and IBS deposited AlF3/LaF3 AR coating,and the corresponding measured reflectances are 0. 04% and 0. 1%,respectively.