多孔硅材料的发展综述

G. G. Ali, M. H. Younus, I. Karomi
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摘要

近年来,多孔材料的性质和应用已成为大量书籍和评论文章的主要主题。多孔硅由于其大的表面积和在室温下强烈的光致发光,已经显示出显著的多功能性和广泛的光电应用前景。在这篇综述中,我们描述了多孔硅(PSi)的制备技术和实验改进,并提供了这种材料的实现和表征的全貌。我们还强调了其重要的化学、结构和表面性质。此外,我们将介绍用于表征多孔硅的技术,包括傅里叶变换红外光谱,x射线衍射测量,原子力显微镜图像(AFM)和扫描探针显微镜(SEM)。此外,本文还讨论了电流密度和刻蚀时间的影响。总之,多孔硅在制造和表征方法上都有了巨大的进步,这使它成为一种有吸引力的现代材料。
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An Overview of the Evolution of the Porous Silicon material: A review
Recently, the properties and applications of porous has become the main subject of a vast numbers of books and review articles. Porous silicon has demonstrated significant versatility and promise for a wide range of optoelectronic applications due to its large surface area and intense photoluminescence at room temperature. In this review, we describe the fabrication techniques and experimental improvements made towards porous silicon (PSi) and we provide a full picture of realization and characterization of this material. We also highlight its important chemical, structure and surface properties. Additionally, we will introduced the techniques that have been used to characterize porouse silicon, including Fourier transform infrared spectroscopy, X-ray diffraction measurements, atomic force microscope images (AFM) and a scanning probe microscope (SEM). Moreover, the effect of the current density and etching time are also documented in this review. In summary, porous silicon has undergone vast improvement in both fabrication and characterization methods, which makes it an attractive modern material.
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