多箔靶中高能电子的k壳电离和特征x射线辐射

S. Trofymenko
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引用次数: 1

摘要

研究了高能电子穿过多箔铜靶时的k壳电离过程和伴随的特征x射线辐射。推导了描述这些过程的主要特征的表达式。结果表明,靶中的平均k壳电离截面不仅由靶材料和电子能量决定,还与靶中箔片的数量、厚度和间距有关。因此,相应的CXR良率不是由聚合目标厚度明确定义的,而是也取决于上述参数。结果表明,在不受密度效应影响的情况下,多箔靶中的平均k壳电离截面可以比该过程的常规截面大几倍。与电子在相同聚集厚度的单一箔上入射的情况相比,这导致了多箔目标的CXR产率的显著提高。并与多箔靶中其他类型x射线发射的产率进行了比较。
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K -shell ionization and characteristic x-ray radiation by high-energy electrons in multifoil targets
Processes of K-shell ionization and accompanying characteristic x-ray radiation (CXR) by high-energy electrons moving through a multifoil copper target are considered. Expressions describing the main characteristics of these processes are derived. It is shown that the average K-shell ionization cross section in the target is not defined just by the target material and the electron energy, but also depends on the number of foils in the target, their thickness and separation between them. The corresponding CXR yield is therefore not unambiguously defined by the aggregated target thickness, but depends on the above parameters as well. It is demonstrated that the average K-shell ionization cross section in a multifoil target can be several times larger than the conventional cross section of this process without the density effect impact. This results in a considerable enhancement of CXR yield from the multifoil target compared to the case of electron incidence upon a single foil of the same aggregated thickness. Comparison of CXR yield in the considered case with the yields of some other types of x-ray emission in multifoil targets is made.
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