光刻材料指南

IF 1.5 2区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Micro/Nanolithography, MEMS, and MOEMS Pub Date : 2020-08-04 DOI:10.1117/1.jmm.19.3.030101
H. Levinson
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引用次数: 0

摘要

JM3联合主编Harry Levinson介绍了关于光刻材料的新指南。
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Lithography materials guidelines
JM3 Co-Editor-in-Chief Harry Levinson introduces new guidelines regarding materials for lithography.
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来源期刊
CiteScore
3.40
自引率
30.40%
发文量
0
审稿时长
6-12 weeks
期刊最新文献
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