复合离子和电子辐射对六氮硼的发光带2 eV

Юрий Владимирович Петров, О.А. Гогина, О.Ф. Вывенко, S. Kovalchuk, K. Bolotin
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引用次数: 0

摘要

宽带隙半导体中的点缺陷,特别是六方氮化硼中的点缺陷,是量子信息学中使用的单光子发射器的有希望的候选者。研究了离子束诱导六方氮化硼缺陷的阴极发光,以及长时间电子辐照对阴极发光强度的影响。结果表明,离子辐照后,其带间发射强度和缺陷相关发射强度均有所降低,在随后的电子辐照过程中,2ev发光带强度增加,而其他波段强度保持不变。
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Влияние комбинированного ионного и электронного облучения на полосу люминесценции 2 eV в гексагональном нитриде бора
Point defects in wide-bandgap semiconductors, in particular in hexagonal boron nitride, are promising candidates for single-photon emitters, used in quantum informatics. We investigated cathodoluminescence of ion beam induced defects in hexagonal boron nitride, as well as the effect of prolonged electron irradiation on the intensity of the luminescence. It has been shown that the intensity of both band-to-band emission and defect related emission decreased after ion irradiation, and during subsequent electron irradiation the intensity of 2 eV luminescence band increased, whereas the intensity of other bands remained unchanged.
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