Deposition and micromachining of graphene nanowall towards high-performance microsystems

Preserved the exceptional properties of graphene, the graphene nanowall (GNW) with inter-networked vertically oriented three-dimensional graphene morphology possess superior potential in constructing advanced microsystems. In this paper, GNW thin film was synthesized through the microwave plasma-enhanced chemical vapor deposition method on SiO2/Si wafer and a spiral GNW microelectrode was further prepared with an achievable pattern resolution of 20 μm. The whole micro-patterning process on GNW demonstrated a good compatibility with the conventional Silicon-based micromachining technique. With the rational discussions on both of the growth mechanism and the microfabrication procedures, this work is expected to pave the way to realize GNW-based electronic devices and progressing the micro-electro-mechanical industry.