多腔室负氢离子源全局模型的界面边界条件

S. Averkin, S. Veitzer
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引用次数: 0

摘要

等离子体放电的全局模型是等离子体流体模拟中包含复杂化学的标准工具。这些模型利用整体能量平衡和物质数量守恒来估计等离子体组分的体积平均密度和温度。为了包括壁面通量,使用了在广泛参数范围内有效的物种密度剖面的简单半解析估计。由于壁面通量估计的性质,全局模型仅限于获得解析解的单腔设计。在本文中,我们提出了界面边界条件的发展,允许使用传统的整体模型分离室。为此,我们提出了双腔几何中双极性扩散问题的近似解。与界面边界条件相对应的附加源项为多室离子源的模拟提供了封闭性。我们打算在全球增强振动动力学模型(GEVKM)[1]的扩展中使用导出的边界条件,并更新氢等离子体化学[2]来模拟多室负氢源。我们分析了推导关系,并讨论了其在IPP Garching开发的负氢离子源中的适用性。
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Interface boundary conditions for global models of multi-chamber negative hydrogen ion sources
Global models of plasma discharges are a standard tool in plasma fluid simulations incorporating complicated chemistry. These models use global balances of energy and conservation of species number in order to estimate volume averaged number densities and temperatures of plasma components. Simple semi-analytic estimates of species density profiles valid in a wide range of parameters are used in order to include wall fluxes. Due to the nature of the wall fluxes estimation, the global models are limited to single chamber designs for which analytic solutions were obtained. In this paper we present the development of interface bound-ary conditions that allow the use of conventional global models for separate chambers. For this reason we present an approximate solution of an ambipolar diffusion problem in a two-chamber geometry. Additional source terms corresponding to interface bound-ary conditions provide closure for simulations of multi-chamber ion sources. We intend to use the derived boundary conditions in an extension of the Global Enhanced Vibrational Kinetic Model (GEVKM) [1] with updated hydrogen plasma chemistry [2] to model multi-chamber negative hydrogen sources. We analyze the derived relations and discuss its applicability for the negative hydrogen ion source developed at IPP Garching.
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