6500V SiC功率MOSFET的研制与分析

Tian Lixin, Yang Fei, Niu Xiping, An Yunlai, Zhang Wenting, Liu Rui, Duan Zechen, Wu Junmin
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引用次数: 2

摘要

我们在6英寸晶圆上成功开发了6500V SiC MOSFET,导通电阻160mΩ,比导通电阻55mΩ.cm2。本文报道了该系统的仿真、制作和电学特性。同时,揭示了本体二极管的一些特性。实验和仿真结果表明,当Vgs=0V时,p阱表面掺杂浓度影响体二极管的导通特性。导通电流主要通过通道从N+源区流向N漂移区。p阱表面掺杂浓度越大,体二极管导通电压越大,反之亦然。当Vgs=-4时,电流主要从P+基极区流向n漂移区,体二极管的导通特性主要受P+基极区影响。
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Development and Analysis of 6500V SiC Power MOSFET
We have successfully developed 6500V SiC MOSFET on 6-inch wafer with the on-resistance of 160mΩ and specific on-resistance of 55mΩ.cm2. In this paper, simulation, fabrication and electrical characteristic are reported. At the same time, some body diode characteristics are revealed. Experiments and simulations show that when Vgs=0V the p-well surface doping concentration affects the body diode conduction characteristics. The conduction current mainly flows from the N+ source region to the N-drift region through the channel. The greater the p-well surface doping concentration, the greater the body diode turn-on voltage, and vice versa. When Vgs=-4, the current flows mainly from the P+ base region to the N-drift region and the conduction characteristics of the body diode are mainly affected by the P+ base region.
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