{"title":"多孔硅可调谐滤光片是MEMS光谱仪的关键元件","authors":"G. Lammel, S. Schweizer, S. Schiesser, P. Renaud","doi":"10.1109/JMEMS.2002.803278","DOIUrl":null,"url":null,"abstract":"We present a microspectrometer based on a tunable interference filter for infrared or visible light that scans the desired part of the spectrum within milliseconds. A single pixel detector measures serially the intensity at selected wavelengths. This concept avoids expensive linear detectors as used for grating spectrometers. The tunable filter is fabricated by a new porous silicon technology using only two photolithography steps. A Bragg mirror or a Fabry-Perot bandpass filter for transmission wavelengths between 400 nm and 8 /spl mu/m at normal incidence is created by modulations of the refractive index in the filter plate. Two thermal bimorph micro-actuators tilt the plate by up to 90/spl deg/, changing the incidence angle of the beam to be analyzed. This tunes the wavelength transmitted to the detector by a factor of 1.16. The filter area can be chosen between 0.27 /spl times/ 0.70 mm/sup 2/ and 2.50 /spl times/ 3.00 mm/sup 2/, the filter thickness is typically 30 /spl mu/m. The spectral resolution of /spl Delta//spl lambda///spl lambda/ = 1/25 is sufficient for most sensor applications, e.g., measurement of CO/sub 2/ and CO in combustion processes by their IR absorption bands as will be presented.","PeriodicalId":13438,"journal":{"name":"IEEE\\/ASME Journal of Microelectromechanical Systems","volume":"103 1","pages":"815-828"},"PeriodicalIF":0.0000,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"81","resultStr":"{\"title\":\"Tunable optical filter of porous silicon as key component for a MEMS spectrometer\",\"authors\":\"G. Lammel, S. Schweizer, S. Schiesser, P. Renaud\",\"doi\":\"10.1109/JMEMS.2002.803278\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a microspectrometer based on a tunable interference filter for infrared or visible light that scans the desired part of the spectrum within milliseconds. A single pixel detector measures serially the intensity at selected wavelengths. This concept avoids expensive linear detectors as used for grating spectrometers. The tunable filter is fabricated by a new porous silicon technology using only two photolithography steps. A Bragg mirror or a Fabry-Perot bandpass filter for transmission wavelengths between 400 nm and 8 /spl mu/m at normal incidence is created by modulations of the refractive index in the filter plate. Two thermal bimorph micro-actuators tilt the plate by up to 90/spl deg/, changing the incidence angle of the beam to be analyzed. This tunes the wavelength transmitted to the detector by a factor of 1.16. The filter area can be chosen between 0.27 /spl times/ 0.70 mm/sup 2/ and 2.50 /spl times/ 3.00 mm/sup 2/, the filter thickness is typically 30 /spl mu/m. The spectral resolution of /spl Delta//spl lambda///spl lambda/ = 1/25 is sufficient for most sensor applications, e.g., measurement of CO/sub 2/ and CO in combustion processes by their IR absorption bands as will be presented.\",\"PeriodicalId\":13438,\"journal\":{\"name\":\"IEEE\\\\/ASME Journal of Microelectromechanical Systems\",\"volume\":\"103 1\",\"pages\":\"815-828\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-12-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"81\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE\\\\/ASME Journal of Microelectromechanical Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/JMEMS.2002.803278\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE\\/ASME Journal of Microelectromechanical Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/JMEMS.2002.803278","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Tunable optical filter of porous silicon as key component for a MEMS spectrometer
We present a microspectrometer based on a tunable interference filter for infrared or visible light that scans the desired part of the spectrum within milliseconds. A single pixel detector measures serially the intensity at selected wavelengths. This concept avoids expensive linear detectors as used for grating spectrometers. The tunable filter is fabricated by a new porous silicon technology using only two photolithography steps. A Bragg mirror or a Fabry-Perot bandpass filter for transmission wavelengths between 400 nm and 8 /spl mu/m at normal incidence is created by modulations of the refractive index in the filter plate. Two thermal bimorph micro-actuators tilt the plate by up to 90/spl deg/, changing the incidence angle of the beam to be analyzed. This tunes the wavelength transmitted to the detector by a factor of 1.16. The filter area can be chosen between 0.27 /spl times/ 0.70 mm/sup 2/ and 2.50 /spl times/ 3.00 mm/sup 2/, the filter thickness is typically 30 /spl mu/m. The spectral resolution of /spl Delta//spl lambda///spl lambda/ = 1/25 is sufficient for most sensor applications, e.g., measurement of CO/sub 2/ and CO in combustion processes by their IR absorption bands as will be presented.