惰性气体对钨中氧现场解吸的增强作用

D. Bassett
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引用次数: 14

摘要

在场离子显微镜成像条件下,研究了从最初的场蒸发钨表面上的氧的场解吸,以确定吸附物在表面上保留的程度。氧的解吸发生在真空中,电场大于蒸发钨衬底所需电场的一半,可能是通过氧化离子的解吸。解吸在一个特定的电场中只发生有限的程度,因为随着解吸的进行,解吸的能量势垒上升。电场越高,解吸程度越大,在氦成像场下,表面仅保留少量吸附质。成像中使用的惰性气体的存在大大增强了解吸作用。氦、氖和氩在1mr时的解吸场分别降低了约12%、17%和32%。真空和气体中解吸特性的差异以及气体中解吸能垒高度的估计强烈表明,解吸的增强主要是由惰性气体场电离释放的高能电子引起的。氦和氖在78?K表示,在没有图像放大的情况下记录离子显微照片所需的时间内,很少(如果有的话)被吸附的氧保留在钨表面。
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The enhancement by inert gases of the field desorption of oxygen from tungsten
Field desorption of oxygen from initially field-evaporated tungsten surfaces has been investigated to determine the extent to which the adsorbate is retained on the surface under the conditions for imaging in a field-ion microscope. Desorption of oxygen occurs in vacuum for electric fields greater than half the field needed to evaporate the tungsten substrate, probably by the desorption of oxide ions. Desorption occurs to only limited extent at a particular field because the energy barrier to desorption rises as desorption proceeds. The extent of desorption is greater the higher the electric field, and at the helium imaging field little adsorbate is retained on the surface. Desorption is greatly enhanced by the presence of the inert gases used in imaging. Helium, neon and argon at 1 mtorr lower the field for desorption to a particular oxygen coverage by approximately 12, 17 and 32% respectively. Differences between the character of desorption in vacuum and in gas and estimates of the height of the energy barriers to desorption in gas strongly suggest that the enhancement of desorption is caused primarily by energetic electrons released by field ionization of the inert gas. The extent of desorption in helium and neon at 78?K indicates that very little, if any, adsorbed oxygen is retained on a tungsten surface for the periods required in recording ion micrographs without image amplification.
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