D. Choi, S. Madden, A. Rode, Rongping Wang, B. Luther-Davies
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Fabrication Process Development for As2S3 Planar Waveguides using Standard Semiconductor Processing
We have developed an effective fabrication process for As2S3 waveguides. A bottom anti-reflection coating provides a suitable layer to protect the As2S3 film from attack by the alkaline developer whilst CHF3 plasma enables the patterning of waveguides with vertical-profile and smooth sidewalls.
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