掺铒硅基电致发光电容器:不同基质对电学和发光性能的影响

Y. Berencén, J. Ramírez, B. Garrido
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引用次数: 0

摘要

我们报道了四种不同的基于掺铒氧化硅(或氮化硅)和(或不含)硅纳米晶体的层的电学和电致发光特性。电学测量使我们能够确定由氮化硅矩阵组成的样品呈现普尔-弗伦克尔型导电,而由氧化硅矩阵形成的样品则表现出福勒-诺德海姆隧穿机制。此外,在1.54 μm处,掺铒氧化硅层的红外功率效率比掺铒氮化硅层高两个数量级。此外,通过比较掺铒硅氧化物和掺铒氮化硅层,我们还观察到在1.54 μm处的功率效率和器件工作寿命之间的一个有趣的权衡。
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Er-doped Si-based electroluminescent capacitors: Role of different host matrices on the electrical and luminescence properties
We report on the electrical and electroluminescence properties of four different layers based on Er-doped silicon oxide (or nitride) with (or without) silicon nanocrystals. Electrical measurements have allowed us to identify that samples composed by silicon nitride matrices present a Poole-Frenkel-type conduction, whereas those ones formed by silicon oxide matrices show a Fowler-Nordheim tunneling mechanism. In addition, infrared power efficiency at 1.54 μm has shown to be two orders of magnitude larger for Er-doped silicon oxide layers than for Er-doped silicon nitrides. Moreover, an interesting trade off between power efficiency at 1.54 μm and device operation lifetime has been observed by comparing both Er-doped silicon oxides and Er-doped silicon nitride layers.
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