FCBGA微凹凸结构的应力评估

W. Y. Huang, E. Chen, D. Jiang, Yu Po Wang, J. Chiang, F. Tsai, R. Huang, E. Lee, I. Chang
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引用次数: 1

摘要

系统级封装(SiP)技术包括多芯片模块(MCM)、多芯片封装(MCP)、堆叠芯片、封装上封装(PoP)、封装中封装(PiP)和嵌入式基板技术。目前的SIP互连方案通常采用Au线键合技术,以Staked Die结构为例,随着堆叠模数的增加,上模需要更长的线键合长度来进行信号互连,导致整个系统的电气性能下降。此外,线键合技术作为堆叠模解决方案,需要在功能芯片之间插入间隔模以增加键合空间,从而增加封装的总厚度。为了获得更好的电性能和减小外形尺寸,开发了一种新的“Micro bump”结构的细间距凸点技术,在顶部和底部芯片上都采用金属凸点。微凸点结构是槽式硅孔(TSV)的关键技术之一,用于芯片间互连,其尺寸小于典型的倒装芯片凸点。
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Stress evaluations in micro bump structures of FCBGA
System in Package(SiP) includes technologies of Multi-chip Module(MCM), Multi-chip Package(MCP), stacked die, Package on Package(PoP), Package in Package(PiP) and Embedded substrate. While Au wire bonding technology is commonly used as current SIP interconnection solution, take Staked Die structure for example, with increasing stack die number the upper die needs longer wire bonding length for signal interconnection and results in lower electrical performance for whole system. In addition, wire bonding technology as Stacked die solution requires spacer die insertion between functional chips for bonding space and thus increases total package thickness. In order to achieve better electrical performance and reduce form factor, a new fine pitch bump technology of “Micro Bump” structure is developed with metal bump for both top and bottom chips. Micro bump structure is one of the key technologies of Trough Silicon Vias (TSV) and is used in chip to chip interconnection with the dimension of Micro bump smaller than typical flip chip bump.
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