{"title":"纳米表面误差光学平面镜的制备","authors":"张. Z. Feng","doi":"10.3788/CO.20140704.0616","DOIUrl":null,"url":null,"abstract":"In order to polish optical flat mirror with nanometer surface error efficiently,a consisting of new polishing technology traditional continuous polishing( CP) and advanced ion beam figuring( IBF) is presented in this paper. The polishing principles of CP and IBF are introduced. The polishing experiment and material removal function of IBF are studied. A Ф150 mm optical flat mirror is polished by the combined polishing technology. After polishing,the surface error and roughness of the flat mirror are 1. 217 nm RMS and0. 506 nm RMS,respectively. The experiment results indicate that the combined polishing technology is effective for polishing optical flat mirror with nanometer surface error.","PeriodicalId":10133,"journal":{"name":"Chinese Journal of Optics and Applied Optics","volume":"25 1","pages":"616-621"},"PeriodicalIF":0.0000,"publicationDate":"2014-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fabrication of optical flat mirror with nanometer surface error\",\"authors\":\"张. Z. Feng\",\"doi\":\"10.3788/CO.20140704.0616\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In order to polish optical flat mirror with nanometer surface error efficiently,a consisting of new polishing technology traditional continuous polishing( CP) and advanced ion beam figuring( IBF) is presented in this paper. The polishing principles of CP and IBF are introduced. The polishing experiment and material removal function of IBF are studied. A Ф150 mm optical flat mirror is polished by the combined polishing technology. After polishing,the surface error and roughness of the flat mirror are 1. 217 nm RMS and0. 506 nm RMS,respectively. The experiment results indicate that the combined polishing technology is effective for polishing optical flat mirror with nanometer surface error.\",\"PeriodicalId\":10133,\"journal\":{\"name\":\"Chinese Journal of Optics and Applied Optics\",\"volume\":\"25 1\",\"pages\":\"616-621\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chinese Journal of Optics and Applied Optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3788/CO.20140704.0616\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chinese Journal of Optics and Applied Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3788/CO.20140704.0616","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fabrication of optical flat mirror with nanometer surface error
In order to polish optical flat mirror with nanometer surface error efficiently,a consisting of new polishing technology traditional continuous polishing( CP) and advanced ion beam figuring( IBF) is presented in this paper. The polishing principles of CP and IBF are introduced. The polishing experiment and material removal function of IBF are studied. A Ф150 mm optical flat mirror is polished by the combined polishing technology. After polishing,the surface error and roughness of the flat mirror are 1. 217 nm RMS and0. 506 nm RMS,respectively. The experiment results indicate that the combined polishing technology is effective for polishing optical flat mirror with nanometer surface error.
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