调度算法在CMP上错开预防性维护动作

S. Ramakrishnan, Shiladitya Chakravorty, Jensen Tay, David Olsen, Peter Zumpano
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引用次数: 0

摘要

在半导体晶圆厂中,将晶圆均匀地分布在一个工具集(执行类似操作的一组工具)上,有助于实现更高的吞吐量,而不是不均匀地加载它们。然而,在某些加工步骤中,水平加载工具导致耗材(在加工晶圆时在工具上使用的材料)的均匀使用,并可能触发同时的预防性维护(PM)行动来补充耗材。同时管理一个小型维护团队的pm会降低工具的可用性,而使用更大的劳动力则需要更高的成本。本研究提出了通过跨工具错开PM操作来克服这种情况的方法
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Staggering Preventive Maintenance Actions at CMP Using a Dispatching Algorithm
In a semiconductor fab, distributing wafers equally across a toolset (set of tools that perform similar operations) helps achieve a higher throughput as opposed to loading them unevenly. However, in some processing steps, level loading tools leads to uniform usage of consumables (material used up at a tool in processing wafers) and can trigger simultaneous Preventive Maintenance (PM) actions to replenish them. Managing simultaneous PMs with a small maintenance team reduces tool availability while using a bigger workforce entails higher costs. This study presents ways to overcome this situation by staggering PM actions across tools
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