溅射过程中稳态压力分布和动态压力波动的测量

Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI:10.3131/JVSJ2.60.220

Shuichi Tajiri, T. Onishi, Yukiko Okano, S. Ogawa, H. Mima

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摘要

测量稳态压力分布和动态压力波动在溅射过程中就秀一1,Takanori馆1,Yukiko冈1,国际OGAWA2和Hiroshi米玛31绒,有限公司,微传感器部门6229 Izuo Taisyo-ku, Osaka-shi, 5510031年大阪,日本2 OGAWA创建研究实验室,7187 Karigutidai Tarumi-ku, Kobe-shi,兵库县655年至0049年,日本大阪市立大学的3、3138杉,Sumiyoshi-ku, Osaka-shi,日本大阪5588585

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Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process

Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process Shuichi TAJIRI1, Takanori ONISHI1, Yukiko OKANO1, Soichi OGAWA2 and Hiroshi MIMA3 1Okano Works, Ltd., Micro sensor Division, 6229 Izuo, Taisyo-ku, Osaka-shi, Osaka 5510031, Japan 2Ogawa Creation Research Laboratory, 7187 Karigutidai, Tarumi-ku, Kobe-shi, Hyogo 6550049, Japan 3Osaka City University, 33138 Sugimoto, Sumiyoshi-ku, Osaka-shi, Osaka 5588585, Japan

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Journal of The Vacuum Society of Japan

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