{"title":"电源和模拟器件趋势、挑战:植入和热处理应用","authors":"T. Kuroi","doi":"10.1109/IIT.2014.6940046","DOIUrl":null,"url":null,"abstract":"Power devices contribute to the building of a smart community in which people and the planet can coexist in prosperity. Analog and sensing devices as input and output interface to microcomputer provide total systems appropriate to expand smart solutions. Relatively matured process technology was used to fabricate these devices. However unique process techniques have recently been utilized to improve the performance of these devices. Especially, an increasing amount of attention has been devoted to ion implantation and annealing technology, since junction formation is the most important technology that can determine the device performance. In this paper, I will report on the technology trends, the current issues and some solutions to overcome these for power and analog devices.","PeriodicalId":6548,"journal":{"name":"2014 20th International Conference on Ion Implantation Technology (IIT)","volume":"30 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Power and analog devices trends, challenges: Implant and thermal processing applications\",\"authors\":\"T. Kuroi\",\"doi\":\"10.1109/IIT.2014.6940046\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Power devices contribute to the building of a smart community in which people and the planet can coexist in prosperity. Analog and sensing devices as input and output interface to microcomputer provide total systems appropriate to expand smart solutions. Relatively matured process technology was used to fabricate these devices. However unique process techniques have recently been utilized to improve the performance of these devices. Especially, an increasing amount of attention has been devoted to ion implantation and annealing technology, since junction formation is the most important technology that can determine the device performance. In this paper, I will report on the technology trends, the current issues and some solutions to overcome these for power and analog devices.\",\"PeriodicalId\":6548,\"journal\":{\"name\":\"2014 20th International Conference on Ion Implantation Technology (IIT)\",\"volume\":\"30 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-10-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 20th International Conference on Ion Implantation Technology (IIT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIT.2014.6940046\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 20th International Conference on Ion Implantation Technology (IIT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIT.2014.6940046","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Power and analog devices trends, challenges: Implant and thermal processing applications
Power devices contribute to the building of a smart community in which people and the planet can coexist in prosperity. Analog and sensing devices as input and output interface to microcomputer provide total systems appropriate to expand smart solutions. Relatively matured process technology was used to fabricate these devices. However unique process techniques have recently been utilized to improve the performance of these devices. Especially, an increasing amount of attention has been devoted to ion implantation and annealing technology, since junction formation is the most important technology that can determine the device performance. In this paper, I will report on the technology trends, the current issues and some solutions to overcome these for power and analog devices.