高功率脉冲磁控溅射制备碳薄膜的表征

Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI:10.3131/JVSJ2.60.341

Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani

{"title":"高功率脉冲磁控溅射制备碳薄膜的表征","authors":"Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani","doi":"10.3131/JVSJ2.60.341","DOIUrl":null,"url":null,"abstract":"Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"48 1","pages":"341-345"},"PeriodicalIF":0.0000,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering\",\"authors\":\"Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani\",\"doi\":\"10.3131/JVSJ2.60.341\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan\",\"PeriodicalId\":17344,\"journal\":{\"name\":\"Journal of The Vacuum Society of Japan\",\"volume\":\"48 1\",\"pages\":\"341-345\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of The Vacuum Society of Japan\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3131/JVSJ2.60.341\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of The Vacuum Society of Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3131/JVSJ2.60.341","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

表征碳薄膜由高功率脉冲磁控溅射Norio NAWACHI1,伊藤Koichi1,Yosuke ISAGI1,吉田2义明Keishi OKAMOTO2和Tatsuyuki NAKATANI31西部地区工业研究中心,广岛县技术研究所,2101 Agaminami Kure-shi,广岛7370004,日本2丰雄先进技术有限公司有限公司5338 Ujina-higashi, Minami-ku, Hiroshima-shi,广岛7348501,日本3技术研究所,冈山理工学大学，1日本冈山市北区立台町1号7000005

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering

Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Journal of The Vacuum Society of Japan

自引率

0.00%

发文量