SAion - SEN独特的450mm离子植入解决方案

N. Suetsugu, M. Tsukihara, M. Kabasawa, F. Sato, T. Yagita
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引用次数: 3

摘要

SAion-450是为即将到来的450mm晶圆一代开发的前沿离子注入器。SAion-450在中电流(MC)和大电流(HC)工艺范围内具有非常广泛的工艺覆盖范围和生产率。虽然450mm晶圆的面积是300mm晶圆的2.25倍,但SAion-450可以以比目前的300mm晶圆植入机MC3-II/GP更高的生产率处理典型的MC配方。此外,低能量(LE)生产率可以显著提高与添加的低能量束流线选项。这可以很容易地安装(或拆除)在生产晶圆厂。SAion产品线还包括300mm型号。SAion-300配备了与SAion-450相同的光束线,以便在300mm晶圆厂中提供与450mm晶圆线相同的工艺特性。因此,SAion系列可以作为桥梁工具,确保晶圆尺寸从300mm平滑过渡到450mm。
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SAion - SEN's unique solution for 450mm ion implant
The SAion-450 is a leading-edge ion implanter developed for the upcoming 450mm wafer generation. The SAion-450 has extremely wide process coverage and productivity throughout both the medium current (MC) and high current (HC) process ranges. Although the area of a 450mm wafer is 2.25 times larger than that of a 300mm wafer, the SAion-450 can process typical MC recipes with higher productivity than the current 300mm MC implanter, the MC3-II/GP. Additionally, low energy (LE) productivity can be significantly enhanced with the addition of the LE beam line option. This can be easily installed (or removed) in a production fab. The SAion product line also includes a 300mm model. The SAion-300 is equipped with the same beamline as the SAion-450 in order to deliver the same process characteristics in 300mm fabs as in 450mm wafer lines. Thus, the SAion series can serve as a bridge tool to assure smooth wafer size transition from 300mm to 450mm.
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