Takeshi Matsumoto, Masatoshi Onoda, Kohichi Orihira, J. Tatemichi, E. Guiot, Olivier Petit, Thibaut Courrenq
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High throughput ion implanter for environmentally beneficial products with III–V compound semiconductor
We have developed an ultra-high current ion implantation system for high throughput wafer processing. The ion source is designed based on implanters used in the flat panel display industry to produce 80 cm high beams which exceed 80 mA. Multiple wafers are processed at a time with the large-sized beam. The implantation tool exhibited throughput of 107 and 38 wafers per hour for 1E16 and 1E17 ions/cm2, respectively. Successful InP layer transfer with smooth surface was demonstrated using Smart Cut™ technology.
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