{"title":"基于协方差-矩阵-自适应进化策略的极紫外光刻掩模缺陷补偿优化(订正)","authors":"Heng Zhang, Sikun Li, Xiang-zhao Wang, Chaoxing Yang, Wei Cheng","doi":"10.1117/1.jmm.18.1.019801","DOIUrl":null,"url":null,"abstract":"Abstract. This erratum corrects mistakes in the original paper.","PeriodicalId":16522,"journal":{"name":"Journal of Micro/Nanolithography, MEMS, and MOEMS","volume":"46 1","pages":"019801 - 019801"},"PeriodicalIF":1.5000,"publicationDate":"2019-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum)\",\"authors\":\"Heng Zhang, Sikun Li, Xiang-zhao Wang, Chaoxing Yang, Wei Cheng\",\"doi\":\"10.1117/1.jmm.18.1.019801\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract. This erratum corrects mistakes in the original paper.\",\"PeriodicalId\":16522,\"journal\":{\"name\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"volume\":\"46 1\",\"pages\":\"019801 - 019801\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2019-02-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1117/1.jmm.18.1.019801\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanolithography, MEMS, and MOEMS","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1117/1.jmm.18.1.019801","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
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