具有成像电位的聚酰亚胺薄膜的制备方法

Q3 Engineering 光电工程 Pub Date : 2021-04-15 DOI:10.12086/OEE.2021.200381
Lv Gang, Yang Wei, Mao Danbo, Wu Shibin, Ren Ge
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引用次数: 0

摘要

聚酰亚胺(PI)薄膜因其优异的热稳定性和机械强度而广泛应用于航空航天、微电子等领域。然而,关于其在光学成像方向上的应用报道很少。为了使用PI薄膜进行成像,对PI薄膜的光学均匀性要求非常高。本文制备的直径为100 mm、热膨胀系数低的抗拉伸PI薄膜的光学均匀性满足瑞利判据,在成像领域具有应用潜力。此外,该PI的抗拉强度为285 MPa,是PMDA-ODA型PI的2.6倍;热膨胀系数约为3.2 ppm,与Novastrat®905型PI相当,比商用PI薄膜低一个数量级。这些优良的基本性能为进一步提高PI膜的空间适应性预留了更多的空间。解决PI薄膜的光学均匀性问题将为其在薄膜衍射光学元件中的应用奠定基础。
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Preparation method for polyimide films with imaging potential
Polyimide (PI) film is widely used in aerospace, microelectronics, and other fields because of its excellent thermal stability and mechanical strength. However, there are very few reports about its application in the direction of optical imaging. To use PI film for imaging, the requirements for the optical homogeneity of the PI film are extremely demanding. The optical homogeneity of the stretch-resistant PI film proposed in this paper with 100 mm diameter and low thermal expansion coefficient meets the Rayleigh criterion, which has the potential for applications in the imaging field. In addition, the tensile strength of this PI is 285 MPa, which is ~2.6 times that of the PMDA-ODA type PI; the coefficient of thermal expansion is about 3.2 ppmK-1, which is comparable to that of the Novastrat®905 type PI and is one order of magnitude lower than that of the commercial PI films. These excellent basic properties reserve more space to further improve the space adaptability of the PI film. The solution of the optical homogeneity of the PI film will lay the foundation for its application in thin film diffractive optical elements.
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光电工程
光电工程 Engineering-Electrical and Electronic Engineering
CiteScore
2.00
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6622
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