高纵横比无凸碳膜的场发射特性

S. Horie, K. Asanagi, T. Myojin, T. Higuchi, Y. Yamada, M. Sasaki
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摘要

即使是简单的碳涂层,Si和W尖端的场发射特性也得到了显著改善。在本文中,为了获得澄清机制的线索,我们研究了原子STM观测,包括碳- lms的局部势垒高度(LBH)和场发射成像。我们还研究了碳涂层前后形状控制的W尖端的场发射特征,使我们能够估计尖端尖端的局部电场。从STM观察中,我们发现碳m由具有各种电子特性的纳米级晶粒组成,并且FE电流随晶粒而变化,并且在每个晶粒的边缘附近更高。无论碳涂层的厚度如何,从Fowler-Nordheim (FN)图的斜率评估的eŠective功函数都是恒定的,尽管它们在厚度小于1 nm的范围内大部分是分散的。在此基础上,讨论了碳- lms的低宏观场发射机理。
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Field Emission from Carbon Films with No Protrusions with High Aspect Ratios
Field emission features from Si and W tips are drastically improved upon coating even with simple carbon ˆlms. In this paper, in order to obtain clues to clarify the mechanism, we examine atomistic STM observations including local barrier height (LBH) and ˆeld emission imagings of the carbon ˆlms. And we also examine the ˆeld emission features from the shape-controlled W tips before and after the carbon coatings, enabling us to estimate the local electric ˆeld at the tip apex. From the STM observations, we ˆnd that the carbon ˆlm consists of nm-scale grains with various electronic properties and that the FE current varies grain by grain and is higher near the edge of each grain. The eŠective work functions evaluated from the slopes of the Fowler-Nordheim (FN) plot are constant regardless of the thickness of the carbon coating, although they are largely scattered for the ˆlms thinner than 1 nm. On the basis of the observed results, we discuss the mechanism of low macroscopic ˆeld emission from carbon ˆlms.
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