2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104)

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2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - 最新文献

Novel MIS Al/sub 2/O/sub 3/ capacitor as a prospective technology for Gbit DRAMs

Pub Date : 2000-06-13 DOI: 10.1109/VLSIT.2000.852761 I.S. Park, B. Lee, S. Choi, Jae Soon Im, Seung Hwan Lee, K. Park, Joo-Won Lee, Y. Hyung, Yeong-kwan Kim, H. Park, Y. Park, Sang In Lee, M. Lee

Impacts of strained SiO/sub 2/ on TDDB lifetime projection

Pub Date : 2000-06-13 DOI: 10.1109/VLSIT.2000.852831 Y. Harada, K. Eriguchi, M. Niwa, T. Watanabe, I. Ohdomari

Design of sub-100 nm CMOSFETs: gate dielectrics and channel engineering

Pub Date : 2000-06-13 DOI: 10.1109/VLSIT.2000.852821 Seungheon Song, W.S. Kim, J.S. Lee, T. Choe, J.H. Choi, M. Kang, U. Chung, N. Lee, K. Fujihara, H. Kang, S.I. Lee, M.Y. Lee

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2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104)

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2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - 最新文献

Novel MIS Al/sub 2/O/sub 3/ capacitor as a prospective technology for Gbit DRAMs

Impacts of strained SiO/sub 2/ on TDDB lifetime projection

Design of sub-100 nm CMOSFETs: gate dielectrics and channel engineering