GaAs on (001) Si templates for near infrared InP QD lasers

Jie Huang, Qi Lin, W. Luo, Liying Lin, K. Lau
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Abstract

In this report, we investigate the effects of thermal cycle annealing at high temperature on the defect density and the morphology of GaAs epilayers grown on (001) Si substrates. The defect density of a 2.7 μm-thick GaAs/Si template is 1.4 ×107 cm−2 based on the observation of plan-view transmission electron microscopy, and the surface roughness of the GaAs/Si template is 1.3 nm after the insertion of dislocation filter layers. Optically pumped InP quantum dot microdisk lasers (MDLs) grown on these GaAs/Si templates are fabricated to evaluate the quality of the GaAs/Si templates. Room temperature continuous-wave lasing of the 1.5 μm-diameter MDLs are observed, with very low lasing thresholds ranging from 0.5 to 2 μW.
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近红外InP QD激光器的(001)Si模板上的GaAs
在本报告中,我们研究了高温热循环退火对生长在(001)Si衬底上的GaAs薄膜的缺陷密度和形貌的影响。平面透射电镜观察发现,2.7 μm厚的GaAs/Si模板的缺陷密度为1.4 ×107 cm−2,插入位错滤光片后,GaAs/Si模板的表面粗糙度为1.3 nm。制备了在这些GaAs/Si模板上生长的光泵浦InP量子点微盘激光器(MDLs),以评估GaAs/Si模板的质量。在室温下观察到直径为1.5 μm的mdl连续激光,激光阈值很低,为0.5 ~ 2 μW。
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