{"title":"Recent Status of EUV Lithography, What is the Stochastic Issues?","authors":"Toru Fujimori","doi":"10.1109/ISSM55802.2022.10026917","DOIUrl":null,"url":null,"abstract":"The performance of EUV resist materials are still not enough for the expected HVM requirement, even by using the latest qualifying materials. One of the critical issues is the stochastic issues, which will be become defectivity, like nano-bridge or nano-pinching. The analyzing summary and the resulting classification the stochastic issues in lithography was described in this paper.","PeriodicalId":130513,"journal":{"name":"2022 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"57 12","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM55802.2022.10026917","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The performance of EUV resist materials are still not enough for the expected HVM requirement, even by using the latest qualifying materials. One of the critical issues is the stochastic issues, which will be become defectivity, like nano-bridge or nano-pinching. The analyzing summary and the resulting classification the stochastic issues in lithography was described in this paper.
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