Near-field injection on a Safe System Basis Chip at silicon level

B. Vrignon, A. Doridant, K. Abouda, Y. Gao, D. Pagnoux, T. Marek
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Abstract

Near-field injection at silicon level is a promising method for various areas such as the analysis of radiated immunity to electromagnetic disturbances. Up to now, the research has been mainly focused at PCB level due to the resolution of the near-field probe. This paper presents first investigations of near-field injection on a Safe System Basis Chip at die level. The investigations are focused on one of the regulators included in this IC. The goal is to use the coupling path from 'ultra-high-radiation' to check if the Fail Safe Machine detects correctly the regulator failures during near-field injection. Moreover, simulations help to understand the failure mechanism.
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基于硅级安全系统的近场注入芯片
硅级近场注入是一种很有前途的方法,可用于分析电磁干扰的辐射抗扰性。到目前为止,由于近场探针的分辨率问题,研究主要集中在PCB层面。本文首次在安全系统基础芯片上对近场注射进行了研究。研究的重点是集成电路中包含的一个调节器。目标是使用“超高辐射”的耦合路径来检查故障安全机是否在近场注入过程中正确检测到调节器故障。此外,模拟有助于理解失效机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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