A 1-M bit SRAM on SIMOX material

E. Yee, L. Hite, T. Houston, Y. Sheu, Rajan, Rajgopal, C. Shen, J. Hwang, G. Pollack
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引用次数: 7

Abstract

A 1-M bit SRAM with 0.8 um feature sizes has been successfully fabricated using SIMOX material. The advantages of SOI for low capacitance, latch-up immunity, and reduced collection charge for single events have been long recognized. The demonstration of a 1-M SRAM at 0.8 um is a significant milestone in the evaluation of the technology for fabrication of very large scale integrated circuits.<>
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基于SIMOX材料的1-M位SRAM
利用SIMOX材料成功制备了具有0.8 um特征尺寸的1 m位SRAM。SOI在低电容、锁存抗扰度和降低单事件收集电荷方面的优势早已得到认可。在0.8微米下的1m SRAM的演示是评估超大规模集成电路制造技术的一个重要里程碑
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A feasibility study of SiC on oxide by wafer bonding and layer transferring A 1-M bit SRAM on SIMOX material Characterization of SIMOX material with channeled and unchanneled oxygen implantation Radiation effects in BESOI structures with different insulating layers A bulk-JFET and CMOS/SIMOX technology for low noise, high speed charge-sensitive amplifier
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