Leak current characterization in high frequency operation of CMOS circuits fabricated on SOI substrate

H. Ito, K. Asada
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Abstract

Threshold voltage shift in high frequency operation of CMOS/SOI is experimentally studied, using supply current measurement of inverter chains as test structures. For a large supply voltage the electron-hole generation current becomes dominant, resulting in a lower threshold voltage, while the threshold voltage becomes higher than the DC case for a low supply voltage. This method will be useful as a measure of "substrate current" for floating body CMOS/SOI.
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SOI基板CMOS电路高频工作漏电流特性研究
实验研究了CMOS/SOI高频工作时的阈值电压偏移,以逆变器链的电源电流测量为测试结构。当电源电压较大时,电子空穴产生电流占主导地位,导致阈值电压较低,而当电源电压较低时,阈值电压高于直流情况。这种方法将有助于测量浮体CMOS/SOI的“衬底电流”。
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A new test structure to study electromigration at grain boundaries using the single-crystal aluminum interconnection Test structures for the evaluation of Si substrates Leak current characterization in high frequency operation of CMOS circuits fabricated on SOI substrate Test structure for determining the charge distribution in the oxide of MOS structure Modified transmission line pulse system and transistor test structures for the study of ESD
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