Dislocation density after S-diffusion into p-type InP substrates

I. Weinberg, M. Faur, C. Goradia, R. Clark
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引用次数: 3

Abstract

The increase in dislocation density at the surface of Zn-doped and Cd-doped p-type InP wafers as a result of heat-treatment and closed-ampoule sulfur diffusion was studied. This research was prompted by the observation of consistently lower efficiencies for solar cells made on Zn-doped as compared to Cd-doped InP substrates of nearly identical dopings and etch pit densities, under identical diffusion conditions. For an 11.83% (AM0, 25 degrees C) solar cell made from diffused Zn-doped substrate, the surface dislocation density was about 2*10/sup 7/ cm/sup -2/, whereas for 14.35% (AM0, 25 degrees C) solar cells made from diffused Cd-doped substrate, the surface dislocation density was about 8*10/sup 5/ cm/sup -2/.<>
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s扩散到p型InP衬底后的位错密度
研究了锌掺杂和镉掺杂p型InP晶片表面位错密度因热处理和封闭安瓿硫扩散而增加的现象。这项研究是由于观察到在几乎相同的掺杂和蚀刻坑密度下,在相同的扩散条件下,在掺杂锌的InP衬底上制造的太阳能电池的效率始终低于掺杂镉的InP衬底。对于由扩散掺杂锌衬底制成的11.83% (AM0, 25℃)太阳能电池,表面位错密度约为2*10/sup 7/ cm/sup -2/,而由扩散掺杂镉衬底制成的14.35% (AM0, 25℃)太阳能电池,表面位错密度约为8*10/sup 5/ cm/sup -2/。
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Expertise, optimisation and control of InP and related technologies by scanning photoluminescence measurements Dislocation density after S-diffusion into p-type InP substrates Surface recombination and high efficiency in InP solar cells Molecular beam epitaxial growth techniques for graded-composition InGaAlAs/InP alloys Submicron double heterojunction strained InAlAs/InGaAs HEMTs: an experimental study of DC and microwave properties
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