{"title":"Resource conservation of buffered HF in semiconductor manufacturing","authors":"Y. Inagaki, M. Shimizu","doi":"10.1109/ISSM.2001.962954","DOIUrl":null,"url":null,"abstract":"Buffered HF (BHF), which is a mixture of hydrofluoric acid and ammonium fluoride, is used for etching and cleaning silicon wafers. Waste BHF is generally treated with a variety of chemicals, resulting in the discharge of much wastewater and sludge. We have developed a new method to extend the period of BHF can be used by supplying elements which depend on the ratio of NH/sub 4/F to HF in BHF. This method can reduce the BHF required, reduce the chemicals required to treat waste BHF and decrease the discharge of wastewater and sludge.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.962954","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Buffered HF (BHF), which is a mixture of hydrofluoric acid and ammonium fluoride, is used for etching and cleaning silicon wafers. Waste BHF is generally treated with a variety of chemicals, resulting in the discharge of much wastewater and sludge. We have developed a new method to extend the period of BHF can be used by supplying elements which depend on the ratio of NH/sub 4/F to HF in BHF. This method can reduce the BHF required, reduce the chemicals required to treat waste BHF and decrease the discharge of wastewater and sludge.
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