{"title":"ESD effects on power supply clamps [CMOS ICs]","authors":"T. Yeoh","doi":"10.1109/IPFA.1997.638156","DOIUrl":null,"url":null,"abstract":"Electrostatic discharge (ESD) damage is a common failure mechanism that is seen on CMOS integrated circuit devices. Due to the ever increasing shrinkage in transistor geometries, prevention of ESD damage will become increasingly important. This paper discusses the various device level ESD in the form of power supply clamps. There are numerous power supply clamps that are currently available such as the grounded gate, thick field oxide (TFO), diode string and cantilever diode structures. Selection of the right ESD power supply clamp is essential from the aspects of their limitations, weaknesses, silicon space and effectiveness to ensure robustness during to ESD stresses on devices.","PeriodicalId":159177,"journal":{"name":"Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits","volume":"56 18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.1997.638156","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Electrostatic discharge (ESD) damage is a common failure mechanism that is seen on CMOS integrated circuit devices. Due to the ever increasing shrinkage in transistor geometries, prevention of ESD damage will become increasingly important. This paper discusses the various device level ESD in the form of power supply clamps. There are numerous power supply clamps that are currently available such as the grounded gate, thick field oxide (TFO), diode string and cantilever diode structures. Selection of the right ESD power supply clamp is essential from the aspects of their limitations, weaknesses, silicon space and effectiveness to ensure robustness during to ESD stresses on devices.
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ESD对电源钳位的影响[CMOS ic]
静电放电(ESD)损坏是CMOS集成电路器件中常见的失效机制。由于晶体管几何形状的不断缩小,防止静电放电损伤将变得越来越重要。本文讨论了各种器件级ESD在电源钳位形式下的应用。目前有许多电源钳,如接地栅极,厚场氧化物(TFO),二极管串和悬臂二极管结构。从其局限性、弱点、硅空间和有效性方面考虑,选择合适的ESD电源钳是至关重要的,以确保器件在ESD应力下的稳健性。
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Combination of focused ion beam (FIB) and transmission electron microscopy (TEM) as sub-0.25 /spl mu/m defect characterization tool FIB precision TEM sample preparation using carbon replica A new mechanism of leakage current in ultra-shallow junctions with TiSi/sub 2/ contacts ESD effects on power supply clamps [CMOS ICs] Low-field time dependent dielectric breakdown characterization of very large area gate oxide [CMOS]
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