A study of non-linearity effects of collector and base currents in SiGe heterojunction bipolar transistor

A.F.A. Rahim, M. R. Hashim, A.F.A. Rahim
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Abstract

A material system that appears to have a tremendous advantage and compatible with Si technology is the Si-SiGe system. One problem in npn SiGe HBT is boron out-diffusion from the base. Boron dopant that out-diffuses into the emitter and collector during SiGe growth and subsequent heat treatment results in the formation of parasitic energy barriers at the emitter/base and base/collector junctions. These barriers suppress the injection of electrons from the emitter to the collector which result in reduced collector current. In this work, a study on the non-linearity effects of the collector and base currents of the SiGe HBT is performed using a high performance process and device simulator SILVACO. The understanding of these effects is very important in the fabrication of high speed devices. The characteristics shows that the more out-diffusion of boron (B) at the emitter/base and base/collector junctions, the more non-ideal the currents. The underlying explanation for these trends will be discussed.
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SiGe异质结双极晶体管集电极和基极电流非线性效应的研究
一种似乎具有巨大优势并与硅技术兼容的材料系统是Si- sige系统。npn SiGe HBT的一个问题是硼从基体向外扩散。在SiGe生长和随后的热处理过程中,硼掺杂剂向发射极和集电极扩散,导致在发射极/基极和基极/集电极结处形成寄生能垒。这些势垒抑制了从发射极到集电极的电子注入,从而导致集电极电流减小。在这项工作中,使用高性能工艺和器件模拟器SILVACO对SiGe HBT的集电极和基极电流的非线性效应进行了研究。对这些效应的理解在高速器件的制造中是非常重要的。结果表明,在发射极/基极和基极/集电极接口处,硼(B)向外扩散越多,电流越不理想。对这些趋势的潜在解释将被讨论。
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